发明名称 ZnO/sapphire substrate and method for manufacturing the same
摘要 A ZnO/sapphire substrate includes an R-plane sapphire substrate whose (0 1-1 2) planes are parallel to the surface thereof and a ZnO epitaxial film formed on the R-plane sapphire substrate. The (1 1-2 0) planes of the ZnO epitaxial film are disposed with an interplanar spacing in the range of about 1.623 to 1.627 Å parallel to the (0 1-1 2) planes of the R-plane sapphire substrate.
申请公布号 US6800135(B2) 申请公布日期 2004.10.05
申请号 US20020171631 申请日期 2002.06.17
申请人 MURATA MANUFACTURING CO., LTD. 发明人 KOIKE JUN;IEKI HIDEHARU
分类号 C30B29/16;C23C14/08;C30B23/02;H03H9/02;H03H9/25;(IPC1-7):C30B23/02;C30B25/18;C01B13/00 主分类号 C30B29/16
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