发明名称 Semiconductor photodetector device and manufacturing method thereof
摘要 Reducing a dark current in a semiconductor photodetector provided with a second mesa including an regrown layer around a first mesa. An n-type buffer layer, a n-type multiplication layer, a p-type field control layer, a p-type absorption layer, a cap layer made of p-type InAlAs crystal, and a p-type contact layer 107 are made to grow on a main surface of a n-type substrate. Thereafter the p-type contact layer, the p-type cap layer, the p-type absorption layer and the p-type field control layer are patterned to form a first mesa. Next, after making a p-type regrown layer selectively grow around the first mesa or by forming a groove in the regrow layer located in a vicinity of the p-type cap type during a step of the selective growth, the p-type cap layer containing Al and the regrow layer are separated owing to the groove such that no current path is formed between both layers.
申请公布号 US6800914(B2) 申请公布日期 2004.10.05
申请号 US20020224115 申请日期 2002.08.19
申请人 OPNEXT JAPAN, INC. 发明人 ITO KAZUHIRO;TANAKA SHIGEHISA;FUJISAKI SUMIKO;MATSUOKA YASUNOBU;TOYONAKA TAKASHI
分类号 H01L31/107;H01L27/095;H01L27/14;H01L31/00;H01L31/06;H01L31/072;(IPC1-7):H01L31/107 主分类号 H01L31/107
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