LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD, AND DEVICE MANUFACTURED THEREBY

摘要

PROBLEM TO BE SOLVED: To reduce the exposure of a resist on a substrate to contaminants. SOLUTION: A chamber 10 enclosing a substrate table WT and the substrate for the exposure are prepared. Between the chamber 10 and a processing unit 11 which processes the substrate after the exposure, the substrate is transferred in a substantially contaminant free environment to minimize the exposure to the contaminants of the resist on the substrate. COPYRIGHT: (C)2004,JPO&NCIPI