发明名称 DEVELOPING SOLUTION FOR THERMOSENSITIVE LITHOGRAPHIC PRINTING PLATE AND PLATEMAKING METHOD FOR LITHOGRAPHIC PRINTING PLATE
摘要 <P>PROBLEM TO BE SOLVED: To provide an alkali developing solution which can keep preliminarily determined performance even when a component of a photosensitive layer is dissolved and which can form a sharp and bright image without producing a defect in an image part, and to provide a platemaking method. <P>SOLUTION: The alkali developing solution (called as a developing solution in the following) contains a straight-chain alkylene oxide adduct and a branched alkylene oxide adduct. The developing solution is an alkaline aqueous solution and can be properly selected from well-known alkali aqueous solutions. As for the alkali aqueous solution, a developing solution containing an alkali silicate or non-reducing sugar and a base can be used, and in particular, a solution having 12.5 to 14.0 pH is preferable. The alkali silicate shows alkaline properties when dissolved in water, and it is, for example, an alkali metal silicate such as sodium silicate, potassium silicate and lithium silicate or ammonium silicate. A single kind of the alkali silicate or a combination of two or more kinds may be used. <P>COPYRIGHT: (C)2004,JPO&NCIPI
申请公布号 JP2004272152(A) 申请公布日期 2004.09.30
申请号 JP20030066120 申请日期 2003.03.12
申请人 FUJI PHOTO FILM CO LTD 发明人 TAKAMIYA SHUICHI
分类号 G03F7/004;B41C1/10;G03F7/00;G03F7/32 主分类号 G03F7/004
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