| 摘要 |
<P>PROBLEM TO BE SOLVED: To form a homogeneous, high-precision optical thin film with a desired film-thickness distribution on substrates having various shapes through a method different from conventional ones. <P>SOLUTION: In a sputtering apparatus, the film is formed through physical vapor deposition on the substrate having an irregular or flat shape. The apparatus has at least three control axes which can independently modify the relative positions, etc. of the substrate and cathodes during film formation. <P>COPYRIGHT: (C)2004,JPO&NCIPI |
