| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a method of manufacturing a reticle blank having a strut structure which has uniform and sufficient stiffness on the whole reticle surface. <P>SOLUTION: A resist 24 is applied onto the rear face of a silicon support substrate 21 and patterned, and patterns 24a-24c are formed. Etching work is repeated while shielding plates are exchanged in order of 1a, 1b, 1c on the patterns 24a-24c. Finally, etching is performed without a shielding plate. Apertures 10a-10c which correspond to distribution of etch rate in membrane regions are arranged on the shielding plates 1a-1c, respectively. By using the shielding plates, the etching time duration of each part is so adjusted that the progressing condition of etching becomes equal all over membrane part. <P>COPYRIGHT: (C)2004,JPO&NCIPI</p> |
