摘要 |
<p>A workpiece processing system, which is capable of accurate and efficient positioning during teaching. A workpiece processing system, comprising processing devices (12A, 12B) having mounts (14A, 14B) for mounting workpieces (W) thereon for applying predetermined processing to the workpieces, a directional positioning device (32) for detecting the amount and direction of eccentricity of a workpiece mounted on a reference block (52), at least one transfer mechanism (20, 40A, 40B) installed between the directional positioning device and the processing device, and a controller (70) for controlling the transfer mechanism and the directional positioning device, wherein the controller has the steps of finding, as the amount of both-way positional deviation, the amount of positional deviation of a positioning base plate when the latter is moved back as it is conveyed forward and backward between the reference block and the mount by the transfer mechanism, finding, as the amount of one-way positional deviation, the amount of positional deviation of the positioning base plate when the latter, which is correctly positioned and mounted on the mount, is conveyed to the reference block by the transfer mechanism, and correcting the conveyance position on the mount side by the transfer mechanism on the basis of the amounts of both-way positional deviation and one-way positional deviation. Thereby, positioning during teaching is accurately and efficiently effected.</p> |