发明名称 METHODS FOR PRODUCING A SEMICONDUCTOR COMPONENT AND SEMICONDUCTOR COMPONENT
摘要 Production of a semiconductor component (1) comprises; (a) forming electrical contact surfaces together within a smaller contacting region (31) as the whole surface of the front side (33) of the semiconductor chip (3); (b) applying a buffer layer (7) on a rear plate (83) forming the rear side surface (81); (c) applying and fixing the chip on the buffer layer to the rear side; (d) applying a buffer layer on and around the chip; and (e) fixing a contact passage plate (84) with a recess (85) on the buffer layer on the front side of the chip. An Independent claim is also included for an alternative process for the production of the semiconductor component.
申请公布号 SG106156(A1) 申请公布日期 2004.09.30
申请号 SG20030005360 申请日期 2003.08.26
申请人 INFINEON TECHNOLOGIES AG 发明人 HARRY HEDLER;THORSTEN MEYER;BARBARA VASQUEZ
分类号 H01L23/31 主分类号 H01L23/31
代理机构 代理人
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