发明名称 |
METHODS FOR PRODUCING A SEMICONDUCTOR COMPONENT AND SEMICONDUCTOR COMPONENT |
摘要 |
Production of a semiconductor component (1) comprises; (a) forming electrical contact surfaces together within a smaller contacting region (31) as the whole surface of the front side (33) of the semiconductor chip (3); (b) applying a buffer layer (7) on a rear plate (83) forming the rear side surface (81); (c) applying and fixing the chip on the buffer layer to the rear side; (d) applying a buffer layer on and around the chip; and (e) fixing a contact passage plate (84) with a recess (85) on the buffer layer on the front side of the chip. An Independent claim is also included for an alternative process for the production of the semiconductor component. |
申请公布号 |
SG106156(A1) |
申请公布日期 |
2004.09.30 |
申请号 |
SG20030005360 |
申请日期 |
2003.08.26 |
申请人 |
INFINEON TECHNOLOGIES AG |
发明人 |
HARRY HEDLER;THORSTEN MEYER;BARBARA VASQUEZ |
分类号 |
H01L23/31 |
主分类号 |
H01L23/31 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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