| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a fine and stable target used when a ternary system sulfide phosphor thin film, such as a thioaluminate system or a thiogallate system is formed by a sputtering method, and capable of forming a high intensity phosphor thin film. <P>SOLUTION: The sputtering target contains a matrix material and a luminescent center, and the matrix material is represented by composition formula M<SP>II</SP><SB>v</SB>A<SB>x</SB>B<SB>y</SB>O<SB>z</SB>S<SB>w</SB>. In the composition formula, M<SP>II</SP>represents at least one element selected from Zn, Cd, and Hg, A represents at least one element selected from Mg, Ca, Sr, Ba, and a rare earth element, B represents at least one element selected from Al, Ca, and In, v, x, y, z and w represent an atomic ratio, and v/x=0.05 to 5, y/x=1 to 6, z/(z+w)=0.01 to 0.85, and 0.6≤(v+x+3y/2)/(z+w)≤1.5. <P>COPYRIGHT: (C)2004,JPO&NCIPI |
