| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To reduce inspection time and damage by the irradiation of an electron beam to pixels, in the inspection of a plurality of pixels arranged in a matrix form. <P>SOLUTION: The inspecting device of a plurality of pixels, arranged in a matrix form, formed on a substrate, comprises an electron gun for irradiating a TFT substrate with an electron beam; a secondary electron detector for irradiating the TFT substrate with electron beam for detecting the amount of generated secondary electrons; and a stage for carrying the TFT substrate, while the TFT substrate is retained on the secondary electron detector. The electron gun is arranged on the TFT substrate, retained on the stage for scanning a basic scanning region with the electron beam. Additionally, the electron gun repeats scanning one basic scanning region with electron beam for a specified number of times, to obtain a secondary electron waveform required for inspecting defects in pixels. While the electron gun is scanning each basic scanning region with electron beam, by having a stage travel at all times, the entire region on the TFT substrate is inspected. <P>COPYRIGHT: (C)2004,JPO&NCIPI</p> |
