发明名称 METHOD AND APPARATUS FOR DECOMPOSING HALOGEN-CONTAINING COMPOUND BY PLASMA REACTING METHOD
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a method and an apparatus for decomposing a halogen-containing compound efficiently, simply and rapidly by reacting the halogen-containing compound with water efficiently, without forming soot and a wax-like substance due to a plasma reaction. <P>SOLUTION: A plasma generating method in which the halogen-containing organic compound and water are supplied to an arc 57 generated between a cathode 54 and an anode 55 to form a plasma 56 of a high temperature is provided. By using an energy due to the electrodes generating the arc, the halogen-containing compound and water evaporate by the function of a diaphragm vibrating with frequencies of supersonic wave, and the obtained gas is reacted at a high temperature portion of the discharging area to decompose the halogen-containing compound. <P>COPYRIGHT: (C)2004,JPO&NCIPI</p>
申请公布号 JP2004268009(A) 申请公布日期 2004.09.30
申请号 JP20030107130 申请日期 2003.03.06
申请人 FUJIMURA TADAMASA 发明人 WATANABE TAKAYUKI;SHIOZAKI SHIGERU;FUJIMURA TADAMASA
分类号 B01D53/70;B01J19/08;B01J19/10;(IPC1-7):B01J19/08 主分类号 B01D53/70
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