| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a stencil reticle manufacturing method which is capable of ensuring a stitching margin through a comparatively easy method and improving a pattern connection accuracy and to provide others. <P>SOLUTION: When CAD data on segment patterns 101A and 101B which are complementarily divided are provided, the CAD data are divided into primary data and secondary data. The primary data represent a primary pattern 110 which is shorter from each pattern by a certain length from the actual end of the pattern, and the secondary data represent a secondary pattern 120 that is the portion shortened from the pattern. In an electron beam lithographic device, the primary pattern is drawn on beam conditions under which a normal pattern is formed, and the secondary pattern is drawn by defocusing the beam to a prescribed amount. With this setup, the image 120' of the secondary pattern 120 is drawn defocused as a whole, and is formed into a pencil-shaped pattern. Therefore, a pencil-shaped pattern can be formed through a comparatively easy work without increasing the volume of CAD data so much. <P>COPYRIGHT: (C)2004,JPO&NCIPI</p> |
