| 摘要 |
PROBLEM TO BE SOLVED: To provide a release vacuum position switch which can be applied to a film deposition apparatus of vapor deposition apparatuses or sputtering apparatuses, capable of constantly detecting the position of a work with an object to be film-deposited mounted thereon, and automating the film deposition apparatus. SOLUTION: The release vacuum position switch has a structure in which a release cable metal piece 6b containing a movable body 7 is fixed to one end of a flange 11 in a vacuum container 1 to keep a vacuum working area, a transparent cylindrical body 14 is vacuum-sealed and fixed to the other end by an O-ring 12 and an O-ring holder 13, the displacement of a work 4 in the vacuum working area is detected by one end of the movable body 7, and the moving state of the other end of the movable body 7 inside the transparent cylindrical body 14 is monitored by displacement by an external detector 15 having the function of converting the displacement signal into the electrode signal, and an inner surface of the transparent cylindrical body 14 is not directly exposed to the vacuum container 1. COPYRIGHT: (C)2004,JPO&NCIPI
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