| 摘要 |
PROBLEM TO BE SOLVED: To provide a mask for vapor deposition, which can cope with highly precise patterning by correcting nonuniformity such as a temperature change and a temperature distribution due to an effect of radiant heat, in order to remove the adverse effect of the radiant heat on pattern location accuracy. SOLUTION: The mask for vapor deposition comprises a thin platy main body 1 having an aperture 1b formed into a shape corresponding to the vapor deposition pattern, and a frame 2 for retaining the main body 1 of the mask, wherein insulation members 5 and 6 for insulating the heat radiating from a vapor deposition source is arranged on a vapor deposition source side of the frame 2, or a heat radiation member 9 for radiating the heat received by the frame 2 from the vapor deposition source is arranged on the opposite side of the vapor deposition source in the frame 2. COPYRIGHT: (C)2004,JPO&NCIPI
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