发明名称 METHOD FOR MANUFACTURING SEMICONDUCTOR LIGHT EMITTING ELEMENT
摘要 PROBLEM TO BE SOLVED: To realize a method for manufacturing a nitride semiconductor light emitting element capable of manufacturing it at a high yield. SOLUTION: The method comprises the steps of forming a semiconductor film on a substrate 1, forming a P-side electrode 10, for instance, on which an Au and Al are deposited one by one on the semiconductor film, depositing an insulating film 11, and removing the electrode 10 and the film 11 by a lift-off method. The GaN nitride semiconductor light emitting element stable for horizontal transverse mode and superior to mass-production can be realized. The silver color of the Al can be seen on the surface of the electrode 10 before the lift-off and the gold color of the Au can be seen after the lift-off. COPYRIGHT: (C)2004,JPO&NCIPI
申请公布号 JP2004273752(A) 申请公布日期 2004.09.30
申请号 JP20030062221 申请日期 2003.03.07
申请人 MATSUSHITA ELECTRIC IND CO LTD 发明人 MOCHIDA ATSUNORI;KIDOGUCHI ISAO;YAMADA ATSUSHI
分类号 H01L21/28;H01L21/306;H01S5/22;H01S5/323;H01S5/343;(IPC1-7):H01S5/343 主分类号 H01L21/28
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