| 摘要 |
Disclosed are methods and apparatus for remediating embedded microbiological contaminants, e. g. , mold, fungus and bacteria. The method includes the step of exposing an embedded microbiological contaminant to a gas, e. g. , chlorine dioxide or ethylene gas, thereby remediating the microbiological contaminant. |
| 申请人 |
SELECTIVE MICRO TECHNOLOGIES, LLC;HAMILTON, RICHARD, A.;WARNER, JOHN, J.;O'NEILL, GARY A. |
发明人 |
HAMILTON, RICHARD, A.;WARNER, JOHN, J.;O'NEILL, GARY A. |
