发明名称 APPARATUS AND METHOD FOR CUTTING IC WAFER
摘要 PROBLEM TO BE SOLVED: To prevent cutting scraps from easily adhering onto the surface of an IC wafer, and to reduce damage caused by the cutting scraps . SOLUTION: An apparatus for cutting the IC wafer comprises an IC wafer supporting apparatus for fixing the IC wafer, a dicing apparatus for cutting the IC wafer by using rotary blades, and a storage tank for storing a cooling cleaning liquid for cooling and cleaning the rotary knife and the IC wafer. The IC wafer is dipped into the cooling cleaning liquid, is erected for installation, and is cut. COPYRIGHT: (C)2004,JPO&NCIPI
申请公布号 JP2004273634(A) 申请公布日期 2004.09.30
申请号 JP20030060252 申请日期 2003.03.06
申请人 SEIKO EPSON CORP 发明人 KATO ATSUSHI
分类号 H01L21/301;(IPC1-7):H01L21/301 主分类号 H01L21/301
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