| 摘要 |
PROBLEM TO BE SOLVED: To provide an EUV aligner having an autofocus control mechanism that can perform highly accurate control. SOLUTION: A mask 14 has a pattern area 10 in which a transfer pattern is formed. Of the pattern region 10, a circular-arcuate one-shot exposure field 11 is illuminated and transferred by means of an optical illumination system 1. At the time of performing scanning exposure, the mask 14 is moved upward or downward in the figure so that the whole surface of the pattern area 10 may be illuminated successively. A mask AF measuring instrument 6 has points of measurement matched to the one-shot exposure field 11 as shown in th figure. The measured value corresponding to the front of scanning is used as the measured value at the point of measurement on the outside 12 or inside 13 of the circular arc of the exposure field 11 of the points of measurement. COPYRIGHT: (C)2004,JPO&NCIPI
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