| 摘要 |
PURPOSE: A substrate having a device to be tested, a method for fabricating the substrate, a substrate for an electrooptic device, an electrooptic device and an electronic device are provided to correctly estimate characteristics of layer patterns and securely expose a pad through one-time etching. CONSTITUTION: A substrate for an electrooptic device includes a plurality of line patterns(111,112) formed of a layer on a substrate having a device to be tested, an interlevel layer(113) formed on the plurality of line patterns, a plurality of contact holes(114,115) formed in the interlevel layer, corresponding to parts of the line patterns, and a layer formed between the substrate and the line patterns. The interlevel layer has a flat surface. The thicknesses of the layer, corresponding to the contact holes, are equal or similar.
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