MONITORING EQUIPMENT FOR INSPECTING WAFER PASSED THROUGH SEMICONDUCTOR PROCESSES TO FEEDBACK VARIATION OF SKEW AND THE FIRST CD TARGET OF PROJECTION EXPOSURE APPARATUSES

摘要

PURPOSE: Monitoring equipment for inspecting a wafer passed through semiconductor processes is provided to feedback the variation of skew and the first CD(critical dimension) target of a plurality of projection exposure apparatuses such that the variation is caused by the tolerance of the projection exposure apparatuses by calculating and displaying the skew and the first critical width target. CONSTITUTION: At least one of the first measuring unit(30) measures at least one of the first CD. At least one of the second measuring unit(40) measures at least one of the second CD. A control unit(60) stores at least the measured first and second CD's, connected to the first and second measuring units by a network. The control unit calculates a skew and the first CD target wherein the skew is a difference between the first and second CD's.