| 摘要 |
<P>PROBLEM TO BE SOLVED: To restrain a polishing removing quantity of a glass substrate from reducing by the loading of polishing cloth caused with the lapse of time of polishing work by removing the loading of the polishing cloth simultaneously with polishing in continuous polishing of the glass substrate. <P>SOLUTION: This loading removing device of the polishing cloth 16 for polishing the glass substrate, removes the loading of the polishing cloth 16 by slidingly contacting the tip of a bristle implanted part 3 with the polishing cloth 16 by dead weight of a brush body by moving a bearing part downward when removing the loading by slidingly contacting the tip of the bristle implanted part 3 with the polishing cloth 16 stuck to a rotating polishing board 15 by vertically movably installing a brush 1 applied to a disk 2 having a rotary shaft in a bearing part 11 for supporting the rotary shaft. <P>COPYRIGHT: (C)2004,JPO&NCIPI |
