POLYMER FOR PHOTORESIST, PHOTORESIST COMPOSITION CONTAINING THE SAME, AND PREPARATION METHOD THEREOF

摘要

A POLIMER FOR USE IN MAKING A CHEMICALLY AMPLIFIED PHOTORESIST, A PHOTORESIST COMPOSITION CONTAINING THE POLYMER, AND A METHOD OF PREPARING THE SAME. THE POLYMER FOR A PHOTORESIST IS FORMED BY POLIMERIZING THREE OR MORE DIFFERENT MONOMERS AND IT HAS AN ACID-LABILE DI-ALKYLMALONATE GROUP BOUND TO THE BACKBONE OF THE POLYMER. THE POLYMER CAN BE USED TO FROM A PHOTORESIST COMPOSITION THAT INCLUDES THE POLYMER AND A PHOTOSENSITIVE ACID GENERATOR. THE PHOTORESIST COMPOSITION IS SUITABLE FOR FORMING A PATTERN HAVING AN EXCELLENT PROFILE DUE TO THE HIGH CONTRAST AND HIGH THERMAL DECOMPOSITION TEMPERATURE OF THE PHOTORESIST COMPOSITION.