发明名称 ELECTRON BEAM SOURCE, ELECTRON OPTICAL APPARATUS USING SUCH BEAM SOURCE, AND METHOD OF OPERATING ELECTRO BEAM SOURCE
摘要 PROBLEM TO BE SOLVED: To provide an electron beam source of which adjusting performance is improved so as to obtain desired electron beam intensity, and which operates at low source surface temperatures. SOLUTION: This electron beam source 1 is provided with a source surface illuminated with a photon beam 29 of adjustable intensity. The photon beam assists emission of electrons from the source surface due to a photo effect. Emission of electrons is further assisted by an electric extraction field. Furthermore, a heater is provided to further assist emission of electrons by a thermionic effect. An electron beam current is measured, and the intensity of the photon beam is adjusted based on the measured electron beam current. COPYRIGHT: (C)2004,JPO&NCIPI
申请公布号 JP2004273419(A) 申请公布日期 2004.09.30
申请号 JP20030332078 申请日期 2003.09.24
申请人 LEO ELEKTRONENMIKROSKOPIE GMBH 发明人 STEIGERWALD MICHAEL
分类号 H01J37/06;H01J37/073;H01J37/075;H01J37/28;H01L21/027;(IPC1-7):H01J37/073 主分类号 H01J37/06
代理机构 代理人
主权项
地址
您可能感兴趣的专利