| 摘要 |
PROBLEM TO BE SOLVED: To provide a method and an apparatus for measuring stress inside a MEMS element precisely. SOLUTION: A substrate (20) for a MEMS element in one embodiment includes a base material (40) having a first side (42), a strain gauge (30) comprising a polysilicon material formed on the first side, a dielectric material (52) disposed over the strain gauge, and a conductive material (62) in communication with the strain gauge through the dielectric material. The substrate is so formed as to have at least one opening (26) formed therethrough, and the strain gauge is formed adjacent to the at least one opening. COPYRIGHT: (C)2004,JPO&NCIPI
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