| 摘要 |
In one exemplary embodiment of the invention, a method is employed that is directed to forming a resonant reflector on an optoelectronic device, such as a semiconductor laser for example. The exemplary method involves depositing a first material layer on the top layer of the optoelectronic device, where the first material layer having a refractive index and a thickness of about an odd multiple of a quarter of a wavelength to which the optoelectronic device is tuned. A patterned region is then created that extends at least partially into the first material layer. Selected patterned regions are at least partially filled with a second material that has a refractive index that is greater than the refractive index of the first material layer. Finally, a third layer, having a refractive index greater than the refractive index of the first material layer, is deposited immediately adjacent the first material layer.
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