| 摘要 |
PROBLEM TO BE SOLVED: To provide a system and a process for producing a thin film in which particles generated at various parts of the system can be cleaned/removed easily and CVD can be carried out effectively. SOLUTION: In the thin film production system comprising a vaporization system 7 having a material liquid supply section 7a and a vaporizing section 7b, a mixer 5, a reaction chamber 2 and an exhaust system 1, the material liquid supply section 7a is provided with a particle cleaning/removing solvent supply section D. Solvent gas vaporized at the vaporizing section 7b is fed to piping so that particles generated at various parts in the system from the vaporizing section to a gas head 3 disposed above the reaction chamber and adhering to various parts of the system can be cleaned/removed. COPYRIGHT: (C)2004,JPO&NCIPI
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