| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for forming a precoating layer in which the generation of particles can be suppressed in a relatively short time and to provide a method for forming a film. SOLUTION: In a processing apparatus which forms a metal-containing film on the surface of a workpiece W placed on a placing base 16 in a processing container 4 which can be evacuated, when a precoat layer 28 is formed on the placing base, the precoat layer made of a metal-containing nitride film is formed on the surface of the placing base by one time of thermal CVD film formation process while a predetermined treating gas is made to flow in the processing container, and a metal-containing nitride film is formed on the surface of the workpiece. Thus, the generation of the particles is remarkably suppressed. COPYRIGHT: (C)2004,JPO&NCIPI
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