发明名称 METHOD OF WASHING SUBSTRATE FOR DNA CHIP
摘要 PROBLEM TO BE SOLVED: To provide a washing method for a glass substrate for a DNA chip to provide an excellent signal from the DNA chip. SOLUTION: The substrate G for the DNA chip is arranged inside an atmospheric plasma generator for generating atmospheric plasma between a high voltage electrode 1 and a low voltage electrode 2 to treat a treated object by the atmospheric plasma, and a surface of the substrate G is washed by the atmospheric plasma generated in the generator. COPYRIGHT: (C)2004,JPO&NCIPI
申请公布号 JP2004271387(A) 申请公布日期 2004.09.30
申请号 JP20030063794 申请日期 2003.03.10
申请人 AIR WATER INC 发明人 ITO SHIGEKI;AIDA SHINJI
分类号 G01N33/53;B08B7/00;G01N37/00;(IPC1-7):G01N33/53 主分类号 G01N33/53
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