| 摘要 |
PROBLEM TO BE SOLVED: To realize high precision focus calibration by measuring the inclination of an image plane in the scanning direction and to perform exposure with an excellent resolution. SOLUTION: In the exposure method, an article to be processed is exposed with a specified pattern formed on a reticle through a projection optical system while scanning the reticle and the article to be processed synchronously. The exposure method comprises a step for measuring the image plane position of the projection optical system at a plurality of measuring positions different from each other with regard to the scanning direction, and a step for correcting inclination of the image plane due to the projection optical system based on the measurements obtained in the measuring step. COPYRIGHT: (C)2004,JPO&NCIPI |
