RINSING LIQUID FOR SUBSTRATE, AND SUBSTRATE TREATMENT METHOD AND EQUIPMENT

摘要

PROBLEM TO BE SOLVED: To perform a high-quality rinsing treatment on a substrate at a low running cost, and to perform a high-quality cleaning treatment on the substrate at a low running cost without damaging the substrate during the cleaning treatment. SOLUTION: A two-liquid nozzle 5 for cleaning and a nozzle 6 for rinsing are connected by a liquid supply unit 8 which supplies a liquid of ultrapure water added with a small amount of ammonia, that is, pure water containing a small amount of ammonia. In the liquid supply unit 8, a mixing section 83 produces the pure water containing a small amount of ammonia by blending ultrapure water supplied from a pure water supply section 81 and ammonia water supplied from an ammonia water supply section 82. The supply/shutdown of the pure water containing a small amount of ammonia from each nozzle 5 and 6 can be controlled by carrying out the opening/closing control of electromagnetic valves 89A and 89B according to a control signal from a controller 4. COPYRIGHT: (C)2004,JPO&NCIPI