发明名称 |
LAYOUT OF ESD PROTECTION DEVICE TO OPTIMIZE CAPACITANCE AND RESISTANCE VALUE |
摘要 |
PURPOSE: A layout of an ESD(electrostatic discharge) protection device is provided to optimize capacitance and a resistance value necessary for gate coupling in which a resistor is connected between a gate and a power supply terminal or a ground terminal by connecting a capacitor between the gate and an input pad and by extending the poly line of the gate in embodying the gate coupling. CONSTITUTION: Each gate of an NMOSFET(n-channel metal-oxide-semiconductor field-effect-transistor)/PMOSFET is widely extended by a poly material so as to separately form the lower electrode(24) of a coupling capacitor. A gap between the drains of the NMOSFET/PMOSFET is widely extended by a metal material to cover the lower electrode by a width of an active region so that the upper electrode(22) of the coupling capacitor is connected to the drain. A coupling resistor is connected to the gate of the NMOSFET/PMOSFET and the power supply terminal/the ground terminal by a poly line of a winding type.
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申请公布号 |
KR20040082831(A) |
申请公布日期 |
2004.09.30 |
申请号 |
KR20030017520 |
申请日期 |
2003.03.20 |
申请人 |
MAGNACHIP SEMICONDUCTOR, LTD. |
发明人 |
KIM, GIL HO |
分类号 |
H01L27/04;(IPC1-7):H01L27/04 |
主分类号 |
H01L27/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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