ELECTRON BEAM LITHOGRAPHY, MANUFACTURE METHOD OF MATRIX, MATRIX, MANUFACTURE METHOD OF DIE , DIE, OPTICAL ELEMENT AND ELECTRON BEAM LITHOGRAPHY SYSTEM

摘要

PROBLEM TO BE SOLVED: To provide an electron beam lithography capable of performing correction of canceling working errors accumulated in other processes and plotting a diffraction structure by which a prescribed optical performance is obtained.

SOLUTION: A phase change of diffracted light due to shape error of the surface to be plotted of a base material is corrected by adjustment of an interval of the diffraction grating. Concretely, when the height of a curved surface part 100a of the base material 100 (film surface of resist applied on original optical surface of the base material) has an increasing tendency compared with the design data, the interval of a diffraction zone 300a of the part is adjusted so as to become narrower than the design data. Conversely, when the height of a curved surface part 100a of the base material 100 has a decreasing tendency, the interval of a diffraction zone 300a of the part is adjusted so as to become wider than the design data. Thereby, for example, a working error in a cutting work process (error of height dimension of the original optical surface of the base material 100) and a working error in a resist film forming process (error of film thickness of the resist applied on the original optical surface) are eliminated and, as a result, the diffraction structure capable of obtaining the prescribed optical performance can be plotted.

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