发明名称 CLEANING METHOD AND SEMICONDUCTOR MANUFACTURING EQUIPMENT
摘要 PROBLEM TO BE SOLVED: To provide a cleaning method suppressing the corrosion of an outlet port side pipeline component for a semiconductor manufacturing equipment. SOLUTION: The cleaning method includes the step of introducing a cleaning gas containing fluorine so as to be conducted to flow from the upstream of a reaction chamber 10 to the side of the outlet port pipeline 31, and flowing corrosion-resistant gas reacting against the fluorine from an introducing point at the side of outlet port pipeline 31 of the reaction chamber 10. COPYRIGHT: (C)2004,JPO&NCIPI
申请公布号 JP2004273750(A) 申请公布日期 2004.09.30
申请号 JP20030062172 申请日期 2003.03.07
申请人 TOSHIBA CORP 发明人 NAKAO TAKASHI
分类号 B08B7/00;C23C16/44;H01L21/00;H01L21/31;(IPC1-7):H01L21/31 主分类号 B08B7/00
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