发明名称 SELECTIVE REMOVAL OF MATERIAL USING SELF-INITIATED GALVANIC ACTIVITY IN ELECTROLYTIC BATH
摘要 <p>Material of a given chemical type is selectively electrochemically removed from a structure by subjecting portions of the structure to an electrolytic bath. The characteristics of certain parts of the structure are chosen to have electrochemical reduction half-cell potentials that enable removal of the undesired material to be achieved in the bath without applying external potential to any part of the structure. The electrolytic bath can be implemented with liquid that is inherently corrosive to, or inherently benign to, material of the chemical type being selectively removed.</p>
申请公布号 EP1032726(A4) 申请公布日期 2004.09.29
申请号 EP19980946862 申请日期 1998.09.21
申请人 CANDESCENT TECHNOLOGIES CORPORATION 发明人 KNALL, JOHAN, N.;PORTER, JOHN, D.;SPINDT, CHRISTOPHER, J.
分类号 C25F3/02;C23F1/00;H01J9/02;(IPC1-7):C25F3/02 主分类号 C25F3/02
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