| 摘要 |
In a method for applying a scale (7) to a carrier (1,2), a material layer (11) is applied to the carrier in such a way that the change in length on account of temperature change of the material layer (11) corresponds at least approximately to changes in length of the carrier (1,2) on account of temperature change. The scale (7) is introduced into or applied to the material layer (11) with a measuring graduation (7a). The carrier may be an optical element, e.g. a lens (1) of an objective (5) for semiconductor lithography.
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