发明名称 |
Focus monitoring method, focus monitoring apparatus, and method of manufacturing semiconductor device |
摘要 |
Non-telecentric illuminating light obtained by controlling the shape of an opening of an illumination aperture is directed onto a photomask, and a characteristic such that an image of a pattern of the photomask formed by the non-telecentric illumination moves in the direction perpendicular to an optical axis when an image-forming plane is moved in the direction of the optical axis, to perform focus monitoring. This eliminates the need for a special photomask, so that inexpensive and highly precise focus monitoring method, focus monitoring apparatus, and a method of manufacturing a semiconductor device can be obtained.
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申请公布号 |
US6797443(B2) |
申请公布日期 |
2004.09.28 |
申请号 |
US20010986084 |
申请日期 |
2001.11.07 |
申请人 |
RENESAS TECHNOLOGY CORP. |
发明人 |
NAKAO SHUJI;MIYAMOTO YUKI;TAMADA NAOHISA |
分类号 |
G01B11/00;G02B7/04;G02B27/40;G03F7/20;G03F7/207;H01L21/027;(IPC1-7):G03F9/00 |
主分类号 |
G01B11/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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