发明名称 |
Method to remove particulate contamination from a solution bath |
摘要 |
A method of cleaning particulates from a solution bath including at least partially filling a deionized water (DIW) bath for rinsing at least one wafer following chemically cleaning the at least one wafer; rinsing the at least one wafer; transferring the at least one wafer to a downstream process; at least partially draining the DIW from the DIW bath; at least partially filling the DIW bath with a bath cleaning solution; and, applying at least one source of ultrasonic energy to agitate the bath cleaning solution.
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申请公布号 |
US6796315(B2) |
申请公布日期 |
2004.09.28 |
申请号 |
US20030340119 |
申请日期 |
2003.01.10 |
申请人 |
TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. |
发明人 |
LU KUO-LIANG;TSENG WEN-SONG |
分类号 |
B08B3/12;(IPC1-7):B08B3/08 |
主分类号 |
B08B3/12 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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