| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a method for in situ analysis, non-destructively, in real time, with high accuracy, on the film thickness and chemical structure of a nano-order thin film produced in a reactive environment, and a device therefor. <P>SOLUTION: A probe, with a pulse laser source and a laser detector incorporated therein, is vibrated in synchronization with laser pulses. Laser light is irradiated to the surface of the thin film to detect laser light reflected from the thin film only when the probe closest approaches the surface of the thin film, thereby performing film thickness measurement on the thin film by means of optical interference and chemical structure analysis on the thin film by means of absorption spectrochemical analysis. Or else, a probe, connected to a pulse laser source and to a laser detector, is vibrated in synchronization with laser pulses and laser light is irradiated to the surface of a thin film to detect laser light reflected from the thin film by using a near-field scanning probe microscope only when the probe closest approaches the surface of the thin film, thereby performing film thickness measurement on the thin film by means of optical interference and chemical structure analysis on the thin film by means of absorption spectrochemical analysis. <P>COPYRIGHT: (C)2004,JPO&NCIPI</p> |
