| 摘要 |
PROBLEM TO BE SOLVED: To provide a simulation method, a simulation program, and a simulation device for shortening a computational time and improving an accuracy. SOLUTION: About a process by a particle seed such as ion having a strong anisotropic for an entering, an ion angle energy distribution function (IAEDF) which is respectively the function of an angleθand an energy E, and an etching yield energy component which is the coefficient of an action with respect to the surface, are numerically integrated to generate the weighted etching yield ion angle distribution function (EYIADF) in advance. Then, the integration processing of the surface calculation is made in one dimension, which makes it possible to rapidly execute a topography simulation. COPYRIGHT: (C)2004,JPO&NCIPI
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