发明名称 NONVOLATILE SEMICONDUCTOR MEMORY DEVICE AND ITS MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a nonvolatile semiconductor memory device with a small layout size. SOLUTION: The nonvolatile semiconductor memory device includes a memory block 400 which is constituted of a plurality of memory cells 410 arranged in rows and columns. Each of the plurality of memory cells 410 comprises a source region, drain region, channel region formed between the source and drain regions, word gate 412 disposed opposite to the channel region, and nonvolatile memory element formed between the word gate 412 and the channel region. A vertical section of the word gate 412 has a bottom side, a side vertical to the bottom side, and a curved side connecting the bottom side and the side vertical to the bottom side. COPYRIGHT: (C)2004,JPO&NCIPI
申请公布号 JP2004266086(A) 申请公布日期 2004.09.24
申请号 JP20030054451 申请日期 2003.02.28
申请人 SEIKO EPSON CORP 发明人 OWA YOSHIHITO
分类号 H01L27/10;G11C7/00;G11C16/04;H01L21/8246;H01L21/8247;H01L27/115;H01L29/788;H01L29/792;(IPC1-7):H01L21/824 主分类号 H01L27/10
代理机构 代理人
主权项
地址