发明名称 PATTERN DRAWING SYSTEM
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a laser beam drawing system employing a mirror in which malfunction of the mirror device due to an ultraviolet laser beam is prevented. <P>SOLUTION: Before entering a two-dimensionally arranged micromirrors 108, a laser beam is converted into multibeams by a laser beam converter 107 so that each thin laser beam enters each micromirror accurately. Since the ultraviolet laser beam entering the micromirror through the gap between adjacent micromirrors can be controlled, malfunction of the mirror device can be eliminated. <P>COPYRIGHT: (C)2004,JPO&NCIPI</p>
申请公布号 JP2004266198(A) 申请公布日期 2004.09.24
申请号 JP20030056953 申请日期 2003.03.04
申请人 OMI TADAHIRO;BALL SEMICONDUCTOR INC 发明人 OMI TADAHIRO;SUGAWA SHIGETOSHI;TAKEHISA KIWAMU
分类号 G02B3/00;G02B27/18;G03F1/76;G03F7/20;H01L21/027;(IPC1-7):H01L21/027;G03F1/08 主分类号 G02B3/00
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