ANTIREFLECTION FILM FORMING COMPOSITION AND ANTIREFLECTION FILM

摘要

PROBLEM TO BE SOLVED: To provide an antireflection film forming composition capable of forming a resist pattern having a high antireflection effect and having excellent resolution and accuracy without the occurrence of intermixing and an antireflection film formed therefrom.

SOLUTION: In the invention, the antireflection film forming composition contains (A) a polymer having the structure expressed by formula (1) and (B) at least one compound selected from fullerene and fullerene derivative. The antireflection film formed thereof is included.

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