发明名称 POLYETHER RESIN AND COATING LIQUID FOR FORMING INSULATED FILM
摘要 PROBLEM TO BE SOLVED: To provide a polyether resin from which insulated films having low relative dielectric constants and excellent heat resistance can be produced. SOLUTION: This polyether resin is obtained by the polycondensation of a dihalogen compound with at least one of dihydroxy compounds represented by formula (I) [Ar<SP>1</SP>and Ar<SP>2</SP>are each independently a divalent group having one hydroxyl group on the aromatic ring; R<SP>1</SP>and R<SP>2</SP>are each independently a 1 to 20C trivalent organic group; X is a single bond, a 1 to 20C divalent hydrocarbon group, an ether group, a thioether group, a carbonyl group or a divalent group represented by formula (A) (P<SP>1</SP>and P<SP>2</SP>are each independently a monovalent organic group, or may be bound to each other to form a ring)]. COPYRIGHT: (C)2004,JPO&NCIPI
申请公布号 JP2004263021(A) 申请公布日期 2004.09.24
申请号 JP20030053085 申请日期 2003.02.28
申请人 SUMITOMO CHEM CO LTD 发明人 OHASHI KENJI;SUKUMODA ATSUSHI;YOKOTA AKIRA
分类号 C08G65/40;H01L21/312;(IPC1-7):C08G65/40 主分类号 C08G65/40
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