发明名称 THIN FILM DEPOSITION METHOD AND DEPOSITION SYSTEM
摘要 PROBLEM TO BE SOLVED: To provide a thin film deposition method and a deposition system therefor where the yield of a plume can be improved by effectively using the plume without any waste, further, even in the case an oxide superconductive thin film with a stacked structure is obtained, a film deposition process can be reduced, and the reduction of the production cost can be attained. SOLUTION: In the method of depositing a thin film, laser beams 8a to 8c are applied to the surface of a target 7, the constituting grains of the target 7 are beaten out or evaporated to generate a plume 55, a thin film stacked body 34 is passed into the plume 55 for a plurality of times, and the constituting grains comprised in the plume 55 are deposited on the thin film stacked body 34 per pass, so that an oxide superconductive thin film with a stacked structure is deposited on the thin film-stacked body 34. COPYRIGHT: (C)2004,JPO&NCIPI
申请公布号 JP2004263227(A) 申请公布日期 2004.09.24
申请号 JP20030053298 申请日期 2003.02.28
申请人 FUJIKURA LTD 发明人 KAKIMOTO KAZUTOMI;IIJIMA YASUHIRO
分类号 C30B23/08;C23C14/24;C23C14/28;C23C14/56;C30B29/22;H01B12/06;H01B13/00;(IPC1-7):C23C14/28 主分类号 C30B23/08
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