METHOD FOR CLEANING PLASMA PROCESSING APPARATUS AND SUSCEPTOR FOR PLASMA PROCESSING APPARATUS

摘要

PROBLEM TO BE SOLVED: To prolong the life of a susceptor by preventing the deterioration of a film quality due to the riding of a wafer onto sediment fixed onto the substrate placing surface of the susceptor of a plasma processing apparatus. SOLUTION: The manufacturing method of a semiconductor comprises inserting the wafer W into the chamber 1 of the plasma processing apparatus, and repeating a depositing processing and self-cleaning for deposits on a plurality of wafers W. A cloth including warm water is placed for a prescribed period on the sediment 105 fixed to the upper surface of the substrate placing surface 106 of the susceptor for absorbing moisture to lower the fixing force of the sediment 105. Thereafter, the sediment 105 is scrubbed away with a nylon scrubbing brush with the particles of abrasive. COPYRIGHT: (C)2004,JPO&NCIPI