发明名称 SEMICONDUCTOR DEVICE, MANUFACTURING METHOD THEREOF AND PROTECTION TAPE
摘要 PROBLEM TO BE SOLVED: To provide the manufacturing method of a semiconductor device where high reliability is obtained in an operation on grinding of the rear face of a thinned semiconductor wafer, dicing and making of individual chips; and to provide a protection tape and a semiconductor device. SOLUTION: Processing step 11 is a grinding process of the rear face of the semiconductor wafer. Namely, the grinding protection tape is stuck to a main surface side of the semiconductor wafer where an integrated circuit is formed. A rear face side is ground by a prescribed thickness. Then, the system is shifted to the dicing process which is processing step 12. The semiconductor wafer is cut into respective pieces (respective chips) from the rear face while the grinding protection tape is stuck as it is. The grinding protection tape remains as one tape as it is without being completely separated. COPYRIGHT: (C)2004,JPO&NCIPI
申请公布号 JP2004266062(A) 申请公布日期 2004.09.24
申请号 JP20030053994 申请日期 2003.02.28
申请人 SEIKO EPSON CORP 发明人 HIRANO TOMOYASU
分类号 H01L21/304;H01L21/301;(IPC1-7):H01L21/301 主分类号 H01L21/304
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