发明名称 SEMICONDUCTOR DEVICE AND ITS MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To prevent generation of a sink mark in a wax member when bonding a semiconductor element and a ceramic substrate or bonding the ceramic substrate and a base substrate or the like. SOLUTION: A method for manufacturing a semiconductor device is provided with a process for supplying the wax material to a part between the semiconductor element and the substrate, a process for melting the wax material, a process for holding the perimeter of the wax material to an oxidizing atmosphere in the state that the wax material is melted, and a process for solidifying the wax material after holding to a oxidizing atmosphere. Melting point of the wax material is at most 400°C, and it is desirable to include any one metal out of Sn, Pb, Bi, Zn, In, Au and Ag as main component. In the semiconductor device formed by the method, an oxide film whose thickness is at least 5 nm is formed in circumference surface of the wax member. COPYRIGHT: (C)2004,JPO&NCIPI
申请公布号 JP2004265972(A) 申请公布日期 2004.09.24
申请号 JP20030052553 申请日期 2003.02.28
申请人 MITSUBISHI ELECTRIC CORP 发明人 IDETA GORO;MURAI JUNICHI;HIRAOKA KOJI
分类号 H01L23/40;(IPC1-7):H01L23/40 主分类号 H01L23/40
代理机构 代理人
主权项
地址