| 摘要 |
PROBLEM TO BE SOLVED: To form structure having proper workability in a substrate processing equipment where a cassette station and a processing station are connected each other and the substrate discharged from a substrate cassette is liquid-processed in a liquid-processing unit of the processing station, e.g., in an equipment of coating or development forming a resist pattern. SOLUTION: Unit blocks B1, B2, and B3 are made up including the liquid-processing units 3, 7, and 8 carrying out the liquid-processing, a heating unit and a cooling unit carrying out heat treatment related to the liquid-processing, and unit main transferring means 4A, 4B, and 4C for receiving/transferring the substrate with those units. The blocks are made up for each of varied liquid-processing, e.g., forming of an antireflection film, coating of a resist, and its development, and those plural blocks are located in line. COPYRIGHT: (C)2004,JPO&NCIPI
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