发明名称 CONTAMINANT REMOVAL SYSTEM IN THERMAL PROCESSOR
摘要 PROBLEM TO BE SOLVED: To remove contaminant produced during heat development in a heating drum thermal processor. SOLUTION: A medium (film) for heating development releases an airborne contaminant (conveyed by gas) during the heating development of an exposed film. A roller 24 is arranged along a drum 20 in an arched shape and retains the exposed film. Members 28, 30 are spaced and arranged so as to specify an inlet region 36 or an outlet region 42 of film respectively. A duct 60 has a first opening on the roller 24 and has a second opening for guiding gaseous fluid to the outside of the drum. Upon the air stream control, the outside air pulled in from the outside of an enclosure via the inlet region 36 is branched into a stream 76 and a stream 78. The former passes between a curved member 28 and the upper part of the drum 20 and passes through the curved duct 60 and a condensation trap 56. The latter passes between a curved member 30 and the lower part of the drum 20 and, further, passes through a condensation trap 58. COPYRIGHT: (C)2004,JPO&NCIPI
申请公布号 JP2004264851(A) 申请公布日期 2004.09.24
申请号 JP20040055891 申请日期 2004.03.01
申请人 EASTMAN KODAK CO 发明人 RASSATT BRADLEY B;MCDANIEL DAVID J
分类号 G03C1/498;G03D13/00;(IPC1-7):G03D13/00 主分类号 G03C1/498
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