发明名称 PLASMA PROCESS EQUIPMENT
摘要 <P>PROBLEM TO BE SOLVED: To provide plasma process equipment which can introduce microwave energy efficiently to a treatment room by improving transmission efficiency of the microwave passing an aperture of a slot antenna. <P>SOLUTION: The plasma process equipment is provided with a treatment room, an introduction wave guide 4 having an internal space 20 where a first standing wave of the microwave is formed by resonance, dielectics 5p, 5q in which a second standing wave of the microwave is formed by resonance, and a slot antenna 6 having a slot for introducing the microwave from an internal space 20 to the dielectrics 5p and 5q. The slot 6a is installed so as to substantially make the spot where the loop of the first standing wave is projected vertically to the slot antenna 6, coincident with a spot where the loop of the second standing wave is projected vertically to the slot antenna 6. <P>COPYRIGHT: (C)2004,JPO&NCIPI
申请公布号 JP2004265954(A) 申请公布日期 2004.09.24
申请号 JP20030047695 申请日期 2003.02.25
申请人 SHARP CORP;OMI TADAHIRO 发明人 YAMAMOTO NAOKO;YAMAMOTO TATSUSHI;HIRAYAMA MASAKI;OMI TADAHIRO
分类号 H05H1/46;B01J19/08;C23C16/511;H01J37/32;H01L21/205;H01L21/3065 主分类号 H05H1/46
代理机构 代理人
主权项
地址